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Participation in the SNEC 2009 PV Participation in the 3rd 「SNEC 2009 International Photovoltaic Power Generation Expo」in Shanghai/China

Mitsuboshi Diamond Industrial Co., Ltd. (HQ: Suita, Osaka, President: Yasuaki Miyake) will participate in the coming "Third SNEC 2009 PV Power Expo", held from May 6th (Wed) to May 8th (Fri) in Shanghai, China.
This time we will present a technology for mechanical patterning of thin-film photovoltaic cells, developed with our more than 70 years of experience in glass cutting. We provide a P2P3-process for CIGS, CIGSS, CIS and other thin-film photovoltaic cells of chemical compounds and proposals for other processes for thin-film photovoltaic cells. In the current business period we plan the R&D and demonstration of the MM700-PV, a Multi-Headed-type Stand-alone machine for mechanical patterning. Also, we will introduce the “Green Laser processing technology”, a technology jointly developed together with our German subsidiary MDI Schott Advanced Processing GmbH, for hole-drilling for wiring and marking by micro-ablation of glass panels for thin-film photovoltaic cells.

 

 

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Outline

DateeDi: 2009, May 6th (Wed)~9th (Fri)  

PlaceDi: Shanghai New International Expo Center (SNIEC)
TimeeD: AM9:00~PM4:00  

Booth: T131A

 

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Enquiries

Mitsuboshi Diamond Industrial Co., Ltd

TEL  :  06-6378-3847    FAX  :  06-6378-3851

E-mail  :  contact2@mitsuboshi-dia.co.jp