Mitsuboshi Diamond Industrial Co., Ltd. (HQ: Suita, Osaka, President: Yasuaki Miyake) will participate in the coming 3rd PV Expo 2010 held from March 3rd to 5th at the Big Sight in Tokyo.
On this year’s exhibition MDI will present a patterning technology for thin-film photovoltaic cells, such as CIGS/CIS, that has been developed from more than 70 years of experience in glass cutting. Also the hybrid-type patterning device “MPV800-LMM” that is designed to fit all R&D-environments will be exhibited. Furthermore, a demonstration of the process with the actual devices is scheduled during the whole exhibition. MDI is looking forward to welcome many visitors to their booth to experience their technology.
■ Outline of the exhibition:
Date ： March 3rd (Wed) to 5th (Fri) 2010
Time ： AM10:00～PM6:00 （on Fri 5th only until PM5:00）
Venue ： Tokyo Big Sight： Manufacturer’s Zone 43-48
（Jointly hosted with Sumikin Bussan Matex Corporation）
・Demonstration of the mechanical patterning process
For further information please contact:
Mitsuboshi Diamond Industrial Co.,Ltd., New Business Promotion Department
〒564-0044 Minami Kaneden 2-12-12, Suita-City, Osaka Pref.
TEL：06-6378-3847 FAX：06-6378-3851
E-mail：contact2@mitsuboshi-dia.co.jp